How to compute Scharfetter-Gummel semiconductor discretization
Scharfetter-Gummel (1969) discretization calculator for the semiconductor drift-diffusion model: current density via the Bernoulli function B(x)=x/(e^x-1), thermal voltage, diffusion coefficient, electric field and Debye length. Presets for Si, GaAs, GaN, SiC, Ge, InP, InAs and diamond.
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The Scharfetter-Gummel discretization calculator determines the current density J in semiconductor devices using the standard numerical scheme for drift-diffusion equations, developed by Donald Scharfetter and Hermann Gummel (Bell Labs, 1969) in "Large-signal analysis of a silicon Read diode oscillator" IEEE Transactions on Electron Devices 16(1):64-77. The scheme provides stable exponential interpolation of the current density J = q μ n E - q D ∇n across a discrete mesh, avoiding numerical instabilities of the classical centered scheme. Key formula: J_{i+1/2} = (q μ V_T / Δx) [n_{i+1} · B(-ΔV/V_T) - n_i · B(+ΔV/V_T)], where B(x) = x/(e^x - 1) is the Bernoulli function. It is the workhorse of all commercial TCAD simulators: Synopsys Sentaurus, Silvaco Atlas, Cadence Spectre, DESSIS, COMSOL Semiconductor.
1. Scharfetter-Gummel 1969 formula
The drift-diffusion equation for electrons: J_n = q μ_n n E + q D_n ∇n, where μ_n is mobility, D_n = μ_n V_T (Einstein-Smoluchowski) the diffusion coefficient, V_T = k_B T/q ≈ 25.85 mV at 300 K thermal voltage. Discretized on mesh: J_{i+1/2} = (q μ V_T / Δx) · [n_{i+1} B(-(ψ_{i+1} - ψ_i)/V_T) - n_i B((ψ_{i+1} - ψ_i)/V_T)]. The Bernoulli function B(x) = x/(e^x - 1) has properties: B(0) = 1, B(+∞) = 0, B(-∞) = -∞, B(x) - B(-x) = -x. Guarantees current conservation and monotonicity even with large potential gradients (>> V_T). For ΔV/V_T → 0 it recovers the linear centered scheme. For |ΔV/V_T| > 1, the centered scheme fails (negative density), Scharfetter-Gummel remains stable.
2. Semiconductor materials and parameters
- Silicon Si: μ_n = 1450 cm²/V·s, μ_p = 480, ε_r = 11.7, E_g = 1.12 eV.
- Gallium arsenide GaAs: μ_n = 8500, μ_p = 400, ε_r = 13.1, E_g = 1.42 eV (HEMT, RF).
- Gallium nitride GaN: μ_n = 1000, μ_p = 200, ε_r = 9.5, E_g = 3.4 eV (LED, power).
- Silicon carbide 4H-SiC: μ_n = 900, μ_p = 100, ε_r = 9.7, E_g = 3.26 eV (power).
- Germanium Ge: μ_n = 3900, μ_p = 1900, ε_r = 16.2, E_g = 0.66 eV.
- Indium phosphide InP: μ_n = 5400, μ_p = 200, ε_r = 12.5, E_g = 1.35 eV (laser).
- Indium arsenide InAs: μ_n = 33000, μ_p = 460, ε_r = 15.1 (high-speed HEMT).
- Diamond C: μ_n = 4500, μ_p = 3800, E_g = 5.5 eV (UV detector, power).
3. Range of validity of the scheme
Scharfetter-Gummel is a box-method finite-volume scheme for classical Drude-Pearson drift-diffusion equations. Limits: (a) Velocity saturation: at high fields E > 10⁵ V/cm in Si, μ(E) decreases → extended model needed (Caughey-Thomas, Canali). (b) Hot carriers: in non-equilibrium, energy-balance + impact ionization (Selberherr-Stratton). (c) Quantum confinement: in sub-10nm MOSFET, classical drift-diffusion fails, requires Schrödinger-Poisson coupling or NEGF (Non-Equilibrium Green's Functions). (d) Recombination/generation: SRH, Auger, radiative add source/sink terms. (e) Heterointerfaces: large band discontinuities require thermionic emission boundary. (f) Tunneling: WKB approx for BTBT (band-to-band) and direct gate oxide tunneling. (g) Magnetic fields: Hall effect, magnetoresistance. (h) RF frequencies > 1 THz: beyond relaxation time τ_p, hydrodynamic model required.
4. Worked numerical examples
Example 1 — Si pn-junction diode at 0.5 V forward bias. µ_n=1450, T=300 K, V_T=25.85 mV, Δx=10 nm, ψ₁=0, ψ₂=0.5 V → ΔV/V_T = 19.3. B(+19.3)=4.2e-7, B(-19.3)=19.3. n₁=10¹⁶/cm³, n₂=10¹⁵/cm³. J_SG = (q·µ·V_T/Δx)·[n₂·B(-19.3) - n₁·B(+19.3)] = 1.87 × 10⁵ A/cm². Typical forward-bias diode.
Example 2 — 22nm Si MOSFET at strong inversion. n_inv=5e¹²/cm² × thickness=2nm = 2.5e¹⁹/cm³. ΔV_DS=1V over 22nm. ΔV/V_T=38.6. SG captures correct exp decay accumulation→pinchoff. J_drain ≈ 10⁵ A/cm². GSS Sentaurus model + STMicroelectronics 22FDX FD-SOI.
Example 3 — GaN HEMT 600V power. μ_n=1000 cm²/Vs (2DEG), V_T=25.85 mV, ΔV=600V over 5μm. ΔV/V_T=2.3e4 (extreme). SG gives result, but velocity saturation v_sat=2.5e7 cm/s needed. Synopsys Sentaurus device GaN model.
5. Practical applications of Scharfetter-Gummel
- STMicroelectronics Catania-Agrate: Sentaurus TCAD simulation for BCD8s (Bipolar-CMOS-DMOS) 0.18μm + 16FFC FinFET, automotive Bipolar SiPM (silicon photomultiplier).
- IMM-CNR Catania (Institute for Microelectronics and Microsystems): SiC power device research (MPS diodes, MOSFETs 1.2 kV+), GaN HEMT, Atlas FEM simulations.
- Politecnico Milano DEIB: Marco Sampietro + Maurizio Sansotera + Alessandro Pesatori group develops quantum-corrected Scharfetter-Gummel models for nano-MOSFET.
- Politecnico Torino DET: Andrea Lacaita group SPAD/SiPM + Avalanche Cellular Automata simulations + Sentaurus.
- INFN-Padua + Padua University: silicon strip detectors ATLAS-LHC + STAR RHIC + ALICE LHC, Geant4 + Sentaurus.
- SISSA Trieste 1978 + ICTP Trieste 1964: Stefano Baroni Quantum ESPRESSO ab initio + DFT, coupled with drift-diffusion.
- ISMN-CNR Bologna: organic semiconductor OLED, OFET, OPV simulations with disorder-modified SG.
- Cineca Bologna 1969 Marconi100 + Leonardo HPC 250 PFlops + INFN-CNAF: TCAD Sentaurus + COMSOL on GPU nodes for large simulations (10⁶+ mesh nodes).
6. Comparison with other numerical schemes
Scharfetter-Gummel 1969: Box-method finite-volume scheme based on Bernoulli function, monotonic, conservative, stable for |ΔV| >> V_T. Centered finite differences: unstable for |ΔV/V_T| > 1, numerical oscillations. Upwind first-order: stable but diffusive (artificial diffusion). FCT (Flux Corrected Transport) Boris-Book 1973: minimizes diffusion but TVD constraints. Petrov-Galerkin: finite-element variation with upwind weighting. Streamline upwind Petrov-Galerkin (SUPG): 2D/3D extension of SG. Discontinuous Galerkin (DG): high-order, stability via slope limiting. NEGF: for nano-device < 10nm, Schrödinger + Green functions. Hydrodynamic model (Stratton 1962, Selberherr 1980s): energy-balance, hot carriers. Spherical harmonic expansion (SHE): beyond drift-diffusion, non-equilibrium transport. SG remains the workhorse for semicond > 50 nm.
7. Modern developments and corrections
Modern Scharfetter-Gummel variants include: Kramer-Hitchner 1999 2D triangular generalization. Mock 1972 mixed FE-FV for heterointerfaces. Bank-Rose 1981 global Newton-Raphson convergence analysis. Bank-Coughran 1991 orthogonal Voronoi Box-method. Brezzi-Marini-Pietra 1989 ELLAM Eulerian-Lagrangian Localized Adjoint Method. Quantum-corrected SG: density-gradient (Wettstein-Demmel-Wenzel 2002), Bohm potential, Wigner formalism. NEGF + SG hybrid: Datta-Lake-Klimeck 2002 nano-MOSFETs Stanford. Multiscale TCAD: Synopsys Sentaurus + ATK Quantum + GTS Minimos. Commercial software: Synopsys Sentaurus Device (TCAD), Silvaco Atlas/Victory, Cadence Spectre, COMSOL Semiconductor Module, Ansys TCAD. Open-source: DESSIS (TU Delft), Charon (Sandia), NEMO5 (Purdue), BIA Simulator (UCSD), TIBERCAD (Tor Vergata Rome). HPC: Cineca Leonardo 250 PFlops + INFN-CNAF + LRZ Garching + Jülich. Future experiments: 3D heterogeneous integration (chiplets), quantum dot devices, 2D materials (graphene, MoS₂, WSe₂) require SG extensions.
Updated July 2026
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